Making high-performance scattering-bar OPC masks with vector-scan, variable-shaped e-beam, and raster-scan laser mask writers

Hao Hsing Lu; Raymond Hwang; Vincent Lee; Willy Q; J. Fung Chen; Thomas L. Laidig; Kurt E. Wampler; Roger F. Caldwell

doi:10.1117/12.332871

18 December 1998 Making high-performance scattering-bar OPC masks with vector-scan, variable-shaped e-beam, and raster-scan laser mask writers

Hao Hsing Lu, Raymond Hwang, Vincent Lee, Willy Q, J. Fung Chen, Thomas L. Laidig, Kurt E. Wampler, Roger F. Caldwell

Author Affiliations +

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332871
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

Both the variable-shaped, vector scan e-beam (HL-800M) and raster scan laser (Alta 3000) mask writers are well-suited for making SB OPC style masks. We describe the technical merits and challenges with vector scan e-beam to make successful SB OPC masks for 0.18 micrometer and 0.25 micrometer device generations. We found that raster scan laser mask writers work well for producing SB OPC masks qualified for advanced i-line or DUV processes with minimum linewidth of 0.25 micrometer to 0.35 micrometer. To make consistently high quality binary SB OPC masks, we have developed the Exactimask^TM process, which comprises robust PBS and otical resist processes combined with well-controlled wet chrome etch. Using vector scan e-beam exposure, the minimum resolution achieved is slightly below 0.24 micrometer on mask. The chrome pattern linearity is within plus or minus 20 nm over a range of feature widths from greater than 20.0 micrometer down to less than 0.4 micrometer. The CD uniformity is about 38 nm (maximum X and Y CD range within approximately 130 mm² area measured on a 1.0 micrometer dense CD target. Using our laser mask writer, we have obtained below 0.5 micrometer minimum resolution for chrome features. The Exactimask performance is evaluated in terms of targeting for zero bias, CD uniformity, CD linearity, pattern fidelity, etc. We show die-to-database defect inspection results on MicroUnity's RTP9 and DSM3000 test masks as inspected by an Applied-Orbot RT-8000 system.

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Hao Hsing Lu, Raymond Hwang, Vincent Lee, Willy Q, J. Fung Chen, Thomas L. Laidig, Kurt E. Wampler, and Roger F. Caldwell "Making high-performance scattering-bar OPC masks with vector-scan, variable-shaped e-beam, and raster-scan laser mask writers", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332871

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KEYWORDS

Optical proximity correction

Inspection

Photomasks

Critical dimension metrology

Photoresist processing

Binary data

Laser scattering

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