Laser direct writing system and its lithography properties

GuoGuang Yang; Yibing Shen

doi:10.1117/12.317917

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15 August 1998 Laser direct writing system and its lithography properties

GuoGuang Yang; Yibing Shen

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Proceedings Volume 3550, Laser Processing of Materials and Industrial Applications II; (1998) https://doi.org/10.1117/12.317917
Event: Photonics China '98, 1998, Beijing, China

Abstract

Laser Direct Writing System (LDWS) is a key equipment for manufacturing the binary optical masks. A polar coordinate laser direct writing system was developed and the maximum mask size which can be made is 4 inches. One of its main properties, namely lithography resolution, was analyzed based on the optical intensity distribution in the photoresist. Normally, 0.86 micrometer linewidth on masks can be achieved. In some special case, a super resolution of 0.5 micrometer linewidth can also be obtained, and it will require a more rigorous exposure latitude. The exposure experiment results on LDWS showed good agreement with the theoretical calculations. The approach by using the optical intensity distribution in the photoresist to predict the relations between linewidths and exposure latitude gives out a simple and clear image about the effects of photoresist on lithographic linewidths.

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GuoGuang Yang and Yibing Shen "Laser direct writing system and its lithography properties", Proc. SPIE 3550, Laser Processing of Materials and Industrial Applications II, (15 August 1998); https://doi.org/10.1117/12.317917

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