15 August 1998 Preparation of nanosized SiO2 powder through laser-induced chemical vapor deposition technology
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Abstract
In this article, the mechanism of the LICVD process preparing SiO2 powder is analyzed. We discuss a lot of parameters such as the laser power density, spot size, the mass flowing of reactant, the ration of all reactants, the torch size, etc. After series of experiments, we successfully gained the silica powder which diameter is about 100 nm by using vertical equipment.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhi Chao Wang, Feng Wu, Yongpeng Zhao, Chongqing Wu, Shuisheng Jian, "Preparation of nanosized SiO2 powder through laser-induced chemical vapor deposition technology", Proc. SPIE 3550, Laser Processing of Materials and Industrial Applications II, (15 August 1998); doi: 10.1117/12.317919; https://doi.org/10.1117/12.317919
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