Preparation of nanosized SiO2 powder through laser-induced chemical vapor deposition technology

Zhi Chao Wang; Feng Wu; Yongpeng Zhao; Chongqing Wu; Shuisheng Jian

doi:10.1117/12.317919

15 August 1998 Preparation of nanosized SiO₂ powder through laser-induced chemical vapor deposition technology

Zhi Chao Wang, Feng Wu, Yongpeng Zhao, Chongqing Wu, Shuisheng Jian

Proceedings Volume 3550, Laser Processing of Materials and Industrial Applications II; (1998) https://doi.org/10.1117/12.317919
Event: Photonics China '98, 1998, Beijing, China

Abstract

In this article, the mechanism of the LICVD process preparing SiO₂ powder is analyzed. We discuss a lot of parameters such as the laser power density, spot size, the mass flowing of reactant, the ration of all reactants, the torch size, etc. After series of experiments, we successfully gained the silica powder which diameter is about 100 nm by using vertical equipment.

Citation Download Citation

Zhi Chao Wang, Feng Wu, Yongpeng Zhao, Chongqing Wu, and Shuisheng Jian "Preparation of nanosized SiO₂ powder through laser-induced chemical vapor deposition technology", Proc. SPIE 3550, Laser Processing of Materials and Industrial Applications II, (15 August 1998); https://doi.org/10.1117/12.317919

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