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11 August 1998 Effects of different surface treatments of CZT samples on the values of DCRC FWHM of x-ray diffraction
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Abstract
Cd1-yZnyTe (CZT) wafers with (111) orientations, which serve as the common substrates for Hg1-xCdxTe (MCT) epitaxial deposition, were treated with different processes of mechanical polishing and chemical etching and then tested by x-ray diffraction unit with the same experimental conditions. The conclusion is that the sample surface treatment dramatically influences the values of DCRC FWHM. The most desirable process and its experimental conditions for accurate measurement of DCRC FWHM have also been reported in this paper.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yu Long Mo, Hui Huang, Juan Qin, Hua Chen, Gang Wu, Chaowang Liu, and Dexiu Li "Effects of different surface treatments of CZT samples on the values of DCRC FWHM of x-ray diffraction", Proc. SPIE 3553, Detectors, Focal Plane Arrays, and Imaging Devices II, (11 August 1998); https://doi.org/10.1117/12.318102
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