5 August 1998 Fabrication of polymer channel waveguides by photobleaching
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Proceedings Volume 3557, Current Developments in Optical Elements and Manufacturing; (1998); doi: 10.1117/12.318289
Event: Photonics China '98, 1998, Beijing, China
Abstract
Photobleaching technique is a standard photoresist procedure. A photobleaching process causes a reduction of refractive index in the exposed regions, forming a high index strip waveguide. This method is quite promising.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Qishun Shen, Xiangming Liu, Linlin Qiu, Zhuangqi Cao, Yingli Chen, "Fabrication of polymer channel waveguides by photobleaching", Proc. SPIE 3557, Current Developments in Optical Elements and Manufacturing, (5 August 1998); doi: 10.1117/12.318289; https://doi.org/10.1117/12.318289
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KEYWORDS
Polymers

Polymer multimode waveguides

Channel waveguides

Waveguides

Refractive index

Photoresist materials

Polymer thin films

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