Fabrication of sol-gel optical element with dichromated gelatin as photoresist

Lin Pang; Hui Wei; Yongqun Zeng; Bo Chen; Lurong Guo

doi:10.1117/12.318279

5 August 1998 Fabrication of sol-gel optical element with dichromated gelatin as photoresist

Lin Pang, Hui Wei, Yongqun Zeng, Bo Chen, Lurong Guo

Proceedings Volume 3557, Current Developments in Optical Elements and Manufacturing; (1998) https://doi.org/10.1117/12.318279
Event: Photonics China '98, 1998, Beijing, China

Abstract

Based on the cleaving-etch method and hardening of dichromated gelatin (DCG), DCG was used as a photoresist for fabricating sol-gel optical elements. Anti-etch characteristic of hardened gelatin was investigated. Compared with etching of sol-gel, hardened gelatin could be used as photoresist to fabricate sol-gel optical elements. Coating condition of sol-gel was investigated. The results showed that thickness of coatings was independent of aging time of the sol-gel solution during a month. Thick multilayer sol-gel coatings were etched with HF solution after ammonia treatment. Good linearity was obtained, which showed adaptation of sol-gel coatings to fabricate optical elements. Using DCG resist the cleaving etch with method, the image of mask was transferred into sol-gel coatings. It was tested imitatively to smooth laser beams and the result was satisfactory.

Citation Download Citation

Lin Pang, Hui Wei, Yongqun Zeng, Bo Chen, and Lurong Guo "Fabrication of sol-gel optical element with dichromated gelatin as photoresist", Proc. SPIE 3557, Current Developments in Optical Elements and Manufacturing, (5 August 1998); https://doi.org/10.1117/12.318279

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