5 August 1998 Technology of low-vaporized deposition of diamond film and analysis of optical properties of the film
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Abstract
Composite of diamond film on substrate surface of single silicon is studied with method of Heat Filament Chemical Vaporized Deposition, for the purpose of application in optics. Discuss the questions such as the dependent relationship of the quality of diamond film to the carbon source gas, the technical measures to increase the depositing speed of the diamond film and to depress or decrease graphite growth on the substrate, the temperature suitable for the diamond growth on the substrate, and the influence of damage degree of defects of substrate upon the properties of diamond, etc. Besides, the infrared absorption is analyzed, which is brought about by intrinsic defects of diamond film formed in this composition and by impurities, such as non-quantity of H and N, etc., which are brought about by the influence of growth condition.
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Lianhe Dong, Ying Che, Yie Wang, "Technology of low-vaporized deposition of diamond film and analysis of optical properties of the film", Proc. SPIE 3557, Current Developments in Optical Elements and Manufacturing, (5 August 1998); doi: 10.1117/12.318277; https://doi.org/10.1117/12.318277
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