10 August 1998 Optical method of measuring the thickness of optical films in devices
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Abstract
When the films in the optical or photoelectric devices are produced, usually their thickness is an important parameter. The optical method can be used to measure real-time thickness of films if films are producing on the transparent substrates. Based on thin optics, the principles of measuring thickness of optical films by optical method are expounded in the paper. The measuring instruments are developed. The instruments can measure real-time the optical reflectivity of films during producing them. By processing and analyzing data the thickens of the films can be estimated. The measuring system has been applied in the courses producing experimental tubes and image intensifiers. The measured results are given and analyzed.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yunsheng Qian, Rongguo Fu, Denggao Xu, Benkang Chang, "Optical method of measuring the thickness of optical films in devices", Proc. SPIE 3558, Automated Optical Inspection for Industry: Theory, Technology, and Applications II, (10 August 1998); doi: 10.1117/12.318385; https://doi.org/10.1117/12.318385
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