A water-soluble black photopolymer, containing PVA-SbQ, carbon black, surfactants and solvent, was developed for production of blackmatrix. Blackmatrix made from the black photopolymer has high opacity and good resolution. The negative charged carbon black is more suitable to be used as the light shielding substance. Several methods to shorten the exposure time were studied and discussed. Increasing the content of photosensitive group and exposed by lamp of high irradiation intensity are effective methods to shorten the exposure time. The fabrication of BM using this black photopolymer has some advantages over conventional methods: low cost, low light reflectivity and low pollution.