Influence of H2 plasma treatment on field emission from diamond films

Guang Yuan; Hong Ji; Liying Han; Haifeng Zhao; Hong Jiang; Tianming Zhou; Weibiao Wang; Y. Z. Wang; Changchun Jin; Yixin Jin

doi:10.1117/12.319669

18 August 1998 Influence of H₂ plasma treatment on field emission from diamond films

Guang Yuan, Hong Ji, Liying Han, Haifeng Zhao, Hong Jiang, Tianming Zhou, Weibiao Wang, Y. Z. Wang, Changchun Jin, Yixin Jin

Author Affiliations +

Proceedings Volume 3560, Display Devices and Systems II; (1998) https://doi.org/10.1117/12.319669
Event: Photonics China '98, 1998, Beijing, China

Abstract

The field emission was obtained from hydrogen plasma treated diamond films. It is found that the emission increased and is not stable after hydrogen treatment. Atomic force microscopy study shows that the surface morphology of the diamond films were changed after hydrogen treatment, but the effective work function is not reduced. These results were discussed.

Citation Download Citation

Guang Yuan, Hong Ji, Liying Han, Haifeng Zhao, Hong Jiang, Tianming Zhou, Weibiao Wang, Y. Z. Wang, Changchun Jin, and Yixin Jin "Influence of H₂ plasma treatment on field emission from diamond films", Proc. SPIE 3560, Display Devices and Systems II, (18 August 1998); https://doi.org/10.1117/12.319669

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