18 August 1998 Influence of H2 plasma treatment on field emission from diamond films
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Abstract
The field emission was obtained from hydrogen plasma treated diamond films. It is found that the emission increased and is not stable after hydrogen treatment. Atomic force microscopy study shows that the surface morphology of the diamond films were changed after hydrogen treatment, but the effective work function is not reduced. These results were discussed.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Guang Yuan, Guang Yuan, Hong Ji, Hong Ji, Liying Han, Liying Han, Haifeng Zhao, Haifeng Zhao, Hong Jiang, Hong Jiang, Tianming Zhou, Tianming Zhou, Weibiao Wang, Weibiao Wang, Y. Z. Wang, Y. Z. Wang, Changchun Jin, Changchun Jin, Yixin Jin, Yixin Jin, } "Influence of H2 plasma treatment on field emission from diamond films", Proc. SPIE 3560, Display Devices and Systems II, (18 August 1998); doi: 10.1117/12.319669; https://doi.org/10.1117/12.319669
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