Paper
18 August 1998 Lie algebraic method for calculating high-order canonical magnetic deflection aberrations
Kangyan Hu, Jingping Zhu, Tiantong Tang
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Abstract
Lie algebraic aberration theory is developed and applied to magnetic deflection systems. Employing this new algebraic tool, all third- and fifth-order canonical magnetic deflection aberrations (including canonical position and momentum aberrations at arbitrary observation planes) are derived. The results are in exactly agreement with those obtained by the conventional successive approximation aberration theory. The present paper lays a theoretical groundwork for further studies on Lie algebraic theory for calculating higher-order aberrations of scanning probe systems.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kangyan Hu, Jingping Zhu, and Tiantong Tang "Lie algebraic method for calculating high-order canonical magnetic deflection aberrations", Proc. SPIE 3560, Display Devices and Systems II, (18 August 1998); https://doi.org/10.1117/12.319678
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KEYWORDS
Magnetism

Aberration theory

Lithium

Electron beams

Electronics engineering

Electromagnetism

Laser beam diagnostics

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