19 August 1998 Dielectric interference coatings for medical examiner set up at 193 nm
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Proceedings Volume 3573, OPTIKA '98: 5th Congress on Modern Optics; (1998) https://doi.org/10.1117/12.324567
Event: OPTIKA '98: Fifth Congress on Modern Optics, 1998, Budapest, Hungary
Abstract
The results of obtaining and investigations coated optics in deep ultra violet (UV) at 193 nm are considered. For successful using in excimer lasers and medical systems the separate optical elements must provide either a good transmission for laser irradiation or enough high reflection. Numerical design and obtaining of UV dielectric coatings are strongly influenced by the material properties in this wavelength region. The peculiarities for thin films in this region are: a limiting factor of the evaporation materials, homogeneous of the film along the surface, and high laser strength. The interaction between excimer laser photons and optical coatings can be determined as two combined process of high repetition rates and high energy densities. These processes influence both on substrate and on film. In this connection the investigations of optical properties of oxides and fluoride films are observed. Besides some new aspects in investigation of pure substrates are obtained. All films were produced by electron-beam evaporation and ion-beam influence was analyzed as variation of optical absorption and laser damage threshold of coated optics.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vladimir V. Novopashin, Elena A. Levchuk, Alexander V. Shestakov, "Dielectric interference coatings for medical examiner set up at 193 nm", Proc. SPIE 3573, OPTIKA '98: 5th Congress on Modern Optics, (19 August 1998); doi: 10.1117/12.324567; https://doi.org/10.1117/12.324567
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