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19 August 1998 Mask-adapted beam shaping for materials processing with excimer laser radiation
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Proceedings Volume 3573, OPTIKA '98: 5th Congress on Modern Optics; (1998) https://doi.org/10.1117/12.320987
Event: OPTIKA '98: Fifth Congress on Modern Optics, 1998, Budapest, Hungary
Abstract
Recent developments of non-rotationally symmetric optical elements (NOEs) for beam shaping in the field of material processing with excimer laser radiation are presented. The performance of a conventional faceted integrator and two faceted NOEs, designed to illuminate an annular aperture mask, are compared. Surface designs of the NOEs and results of material processing (ablation of polyimid foil by KrF excimer laser radiation) are presented. By mask adapted beam shaping NOEs improve the total transmission of the optical system.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joerg Bernges, Lars Unnebrink, Thomas F. E. Henning, Ernst Wolfgang Kreutiz, and Reinhart Poprawe "Mask-adapted beam shaping for materials processing with excimer laser radiation", Proc. SPIE 3573, OPTIKA '98: 5th Congress on Modern Optics, (19 August 1998); https://doi.org/10.1117/12.320987
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