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22 December 1998 Modeling of a photolytically excited HF chemical laser based on a NF3/H2 gas mixture
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Proceedings Volume 3574, XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (1998) https://doi.org/10.1117/12.334500
Event: Twelfth International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, 1998, St. Petersburg, Russian Federation
Abstract
A numerical code has been developed to simulate the characteristics of HF chemical laser based on non-chain reaction pumped by a planar sliding discharge radiation. The model considers transport of VUV pump radiation through the nonlinear absorptive active medium containing NF3/H2/N2/Ar gas mixture coupled with chemical and lasing kinetics describing the temporal and spatial evolution of particle species concentration and intracavity lasing photons density. The relative importance of various kinetic processes is evaluated and a 3.2 J/l laser output specific energy is calculated along the laser axis.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marc P. Sabonnadiere, Vadim I. Tcheremiskine, Marc L. Sentis, L. D. Mikheev, and Philippe Ch. Delaporte "Modeling of a photolytically excited HF chemical laser based on a NF3/H2 gas mixture", Proc. SPIE 3574, XII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (22 December 1998); https://doi.org/10.1117/12.334500
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