Characteristics of deep-UV optics at 193 nm and 157 nm

Glen P. Callahan; Bruce K. Flint

doi:10.1117/12.344438

7 April 1999 Characteristics of deep-UV optics at 193 nm and 157 nm

Glen P. Callahan, Bruce K. Flint

Proceedings Volume 3578, Laser-Induced Damage in Optical Materials: 1998; (1999) https://doi.org/10.1117/12.344438
Event: Laser-Induced Damage in Optical Materials: 1998, 1998, Boulder, CO, United States

Abstract

The increasing use of Argon Fluoride (ArF) 193 nm excimer lasers in microlithography, surgical procedures and other applications have created the requirement for an increasingly larger number of specialized optical components and thin film coatings. At 193nm these include coated components that can withstand long duration exposure to UV radiation without significant change in performance. Similar coatings and components for Fluorine lasers operating at 157 nm are under development. At these deep UV wavelengths, potential coating materials as well as substrates are very limited due to absorption and impurities. Characteristics of various types of thin film coatings including reflective, anti-reflective, beam-splitting, beam attenuating and optical bandpass filters, at both 193nm and 157nm, are measured using a specially designed vacuum spectrophotometer system. Results of these measurements as well as plans for further coating development are presented.

Citation Download Citation

Glen P. Callahan and Bruce K. Flint "Characteristics of deep-UV optics at 193 nm and 157 nm", Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); https://doi.org/10.1117/12.344438

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