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5 April 1983 Light Scattering In Leached Antireflection Surfaces
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Abstract
Chemical leaching processes used to produce antireflective surfaces on glass have been shown to exhibit extremely high laser damage thresholds. For evaluation of their utility in short wavelength operation, surface and bulk scattering effects in samples treated by two processes were investigated. The scattering effects observed in the two processes are compared with evaporated λ/4 interference films. The Neutral Solution process AR surface performs better at short wavelengths than the Minot etch/leached gradient AR surface produced on phase-separated glass because the light scattering associated with the Minot etch/ leached surface is high.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander J. Marker III, Lee Cook, and Karl-Heinz Mader "Light Scattering In Leached Antireflection Surfaces", Proc. SPIE 0362, Scattering in Optical Materials II, (5 April 1983); https://doi.org/10.1117/12.934144
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