Stimulated emission of excitons into microcavity polaritons

Robin Huang; Francesco Tassone; Yoshihisa Yamamoto

doi:10.1117/12.349296

24 May 1999 Stimulated emission of excitons into microcavity polaritons

Robin Huang, Francesco Tassone, Yoshihisa Yamamoto

Proceedings Volume 3624, Ultrafast Phenomena in Semiconductors III; (1999) https://doi.org/10.1117/12.349296
Event: Optoelectronics '99 - Integrated Optoelectronic Devices, 1999, San Jose, CA, United States

Abstract

In this experiment, we propose and demonstrate a novel exciton-exciton scattering process for the case of semiconductor microcavity exciton-polaritons. We show that the scattering rate should be enhanced due to the final state stimulation effect. We have observed the enhancement of the elastic exciton-exciton scattering rate in a semiconductor microcavity. The signature of this stimulated emission is in the enhancement of the scattering rate that is proportional to the final state occupation number. For this reason, we have interpreted the gain to be due to bosonic stimulation. This gain process for exciton- polaritons is distinctly different from that in a conventional photon laser, because of the fermionic nature of the exciton's constituents, the electron and hole.

Citation Download Citation

Robin Huang, Francesco Tassone, and Yoshihisa Yamamoto "Stimulated emission of excitons into microcavity polaritons", Proc. SPIE 3624, Ultrafast Phenomena in Semiconductors III, (24 May 1999); https://doi.org/10.1117/12.349296

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