Paper
6 August 1999 Process simulation of selective-area MOCVD growth for optoelectronic integrated circuits
Muhammad A. Alam, Roosevelt People, Mark S. Hybertsen
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Muhammad A. Alam, Roosevelt People, and Mark S. Hybertsen "Process simulation of selective-area MOCVD growth for optoelectronic integrated circuits", Proc. SPIE 3625, Physics and Simulation of Optoelectronic Devices VII, (6 August 1999); https://doi.org/10.1117/12.356901
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KEYWORDS
Oxides

3D modeling

Waveguides

Vertical cavity surface emitting lasers

Metalorganic chemical vapor deposition

Photonic integrated circuits

Data modeling

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