New methodology for measuring highly aberrated wavefronts induced by diffractive optical elements

Yi-Chun Chen; Shu-Sheng Lee; C. M. Lee; Chih-Kung Lee; G. B. Yeh

doi:10.1117/12.345436

14 April 1999 New methodology for measuring highly aberrated wavefronts induced by diffractive optical elements

Yi-Chun Chen, Shu-Sheng Lee, C. M. Lee, Chih-Kung Lee, G. B. Yeh

Proceedings Volume 3626, Testing, Packaging, Reliability, and Applications of Semiconductor Lasers IV; (1999) https://doi.org/10.1117/12.345436
Event: Optoelectronics '99 - Integrated Optoelectronic Devices, 1999, San Jose, CA, United States

Abstract

Diffractive optical elements (DOE) have been widely used in both scientific and industrial applications. Optical wavefront measurements are one of the most important methodologies in verifying the performance of DOEs. Due to its non-destructive nature, ease of implementation, and relative short operation time, optical interferometry-based systems for wavefront measurements remain popular. The advantages and drawbacks of a non-common path and common path interferometry technique are examined first within this article.

Citation Download Citation

Yi-Chun Chen, Shu-Sheng Lee, C. M. Lee, Chih-Kung Lee, and G. B. Yeh "New methodology for measuring highly aberrated wavefronts induced by diffractive optical elements", Proc. SPIE 3626, Testing, Packaging, Reliability, and Applications of Semiconductor Lasers IV, (14 April 1999); https://doi.org/10.1117/12.345436

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