19 March 1999 Converting SiO2 into crystalline Si for Si-based optoelectronics
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This paper reports a low cost method of converting SiO2 or silica based glass into crystalline silicon by simple thermal annealing of Ti/Al coated SiO2 or silica glass slides. The studies were performed using Raman scattering and x-ray diffraction. The results suggest that it is possible to extract reasonably good quality crystalline silicon from SiO2 based substrates. This technique may have a wide range of applications in Si-based optoelectronics and other industry.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yin-Sheng Tang, Yin-Sheng Tang, S. J. Cai, S. J. Cai, Kang Lung Wang, Kang Lung Wang, } "Converting SiO2 into crystalline Si for Si-based optoelectronics", Proc. SPIE 3630, Silicon-based Optoelectronics, (19 March 1999); doi: 10.1117/12.342792; https://doi.org/10.1117/12.342792

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