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1 June 1999 Analytical approximation for the evaluation of the effect of fabrication error on the reflectivity of a Bragg mirror
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Abstract
In this paper a novel analytical approach to evaluate spectral performances of non-ideal rectangular Bragg gratings, integrated in a slab waveguide is proposed. The effect of errors in the photolithographic definition of the grating, in particular in the period width, is investigated. We refer to gratings fabricated by means of standard e-beam photolithography apparatus. As a comparison, a numerical approach based on the Equivalent Multilayer Theory, combined with the Effective Index Method, is also presented. This procedure allow us to verify the theoretical limit of the analytical approach to better understand its range of applicability.
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Roberto Fiola, Andrea Irace, Antonello Cutolo, and Mario Iodice "Analytical approximation for the evaluation of the effect of fabrication error on the reflectivity of a Bragg mirror", Proc. SPIE 3633, Diffractive and Holographic Technologies, Systems, and Spatial Light Modulators VI, (1 June 1999); https://doi.org/10.1117/12.349331
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