Micro-optical elements fabricated and replicated in semiconductor materials

Fredrik K. Nikolajeff; James R. Leger; Todd A. Ballen

doi:10.1117/12.349337

1 June 1999 Micro-optical elements fabricated and replicated in semiconductor materials

Fredrik K. Nikolajeff, James R. Leger, Todd A. Ballen

Author Affiliations +

Proceedings Volume 3633, Diffractive and Holographic Technologies, Systems, and Spatial Light Modulators VI; (1999) https://doi.org/10.1117/12.349337
Event: Optoelectronics '99 - Integrated Optoelectronic Devices, 1999, San Jose, CA, United States

Abstract

Refractive microoptical elements were originally fabricated by mass-transport smoothing in gallium phosphide. Mass- transport smoothing is based on surface diffusion at elevated temperatures and allows the generation of highly efficient semiconductor microoptics. Starting from a master element, we have developed a replication technique for transferring microoptical surface reliefs into other semiconductor materials, such as gallium arsenide (GaAs). The technique uses a cast and dry etch process. Two different refractive microoptical elements have been replicated into GaAs, a Fresnel biprism and a concave micromirror. The elements have been characterized and show the high fidelity of the replication process.

Citation Download Citation

Fredrik K. Nikolajeff, Fredrik K. Nikolajeff, James R. Leger, James R. Leger, Todd A. Ballen, Todd A. Ballen, } "Micro-optical elements fabricated and replicated in semiconductor materials", Proc. SPIE 3633, Diffractive and Holographic Technologies, Systems, and Spatial Light Modulators VI, (1 June 1999); doi: 10.1117/12.349337; https://doi.org/10.1117/12.349337

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