23 March 1999 Recent advances in holographic materials from Slavich
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A general review of the current holographic materials available from the Micron Plant at AO Slavich is presented. In particular certain improvements to the technical parameters of the materials PFG-01 (notably sensitivity) and PFG-03M (emulsion hardness) are introduced. Likewise the introduction of a new 190 micron TAC film substrate for the PFG-01 and VRP- M emulsions will be mentioned and examples of holograms produced on these emulsions will be shown. Reflection hologram color control techniques using emulsion humidity fixing in special oven are presented and the suitability of these techniques is discussed for various regimes. Recommended chemistries that may be employed with each of the Slavich materials will be discussed in the context of Pulsed and CW radiation sources. Finally, contact copying using the PFG-01 and PFG-03M materials will be briefly mentioned.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yury A. Sazonov, Yury A. Sazonov, Petr I. Kumonko, Petr I. Kumonko, David B. Ratcliffe, David B. Ratcliffe, Gleb R. Skokov, Gleb R. Skokov, Mikhail V. Grichine, Mikhail V. Grichine, } "Recent advances in holographic materials from Slavich", Proc. SPIE 3638, Holographic Materials V, (23 March 1999); doi: 10.1117/12.342818; https://doi.org/10.1117/12.342818

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