Initial results from a Leica ZBA31H+ shaped E-beam mask writer located at the Photronics Advanced Mask Shop in Manchester, England

Stephen Johnson; Paul Marshall; Peter Osborne; Hans-Joachim Doering; Christian Ehrlich

doi:10.1117/12.346229

23 April 1999 Initial results from a Leica ZBA31H⁺ shaped E-beam mask writer located at the Photronics Advanced Mask Shop in Manchester, England

Stephen Johnson, Paul Marshall, Peter Osborne, Hans-Joachim Doering, Christian Ehrlich

Author Affiliations +

Proceedings Volume 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98; (1999) https://doi.org/10.1117/12.346229
Event: 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components, 1998, Munich, Germany

Abstract

Since production started at the Photronics site in Manchester, England, mask writing capability had been centered on laser based technology. The Manchester site has now taken delivery of its first e-beam system: the ZBA 31H+, manufactured by Leica Microsystems Lithography GMBH. The ZBA 31H+) system was designed for the production of reticles utilizing 250 nanometer design technology and is expected to play a key role in Photronics' future reticle development. The addition of an e-beam system to the current laser based technology, in this instance, has been driven by increasing customer demand and the requirement for reticles containing high resolution OPC structures. The ZBA 31H+) is a variable shaped spot, vector scan electron beam lithography system operating at 20 keV. Enhancements from the previous generation system include improved deflection systems, stage metrology, pattern data handling, and an address grid down to 10 nanometers. This system's specified performance enablers it to produce reticles designed to support semiconductor fabrication utilizing 250 nanometer design rules, and beyond, with high accuracy and productivity.

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Stephen Johnson, Paul Marshall, Peter Osborne, Hans-Joachim Doering, and Christian Ehrlich "Initial results from a Leica ZBA31H⁺ shaped E-beam mask writer located at the Photronics Advanced Mask Shop in Manchester, England", Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); https://doi.org/10.1117/12.346229

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KEYWORDS

Photomasks

Reticles

Laser applications

Optical proximity correction

Edge roughness

Metrology

Electron beam lithography

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