Translator Disclaimer
23 April 1999 Overview of SCALPEL mask technology
Author Affiliations +
Proceedings Volume 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98; (1999) https://doi.org/10.1117/12.346223
Event: 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components, 1998, Munich, Germany
Abstract
Scattering with angular limitation projection electron beam lithography is a true 4X reduction technology that capitalizes on high resolution capabilities from electron beam exposure and high throughput capability from projection.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gregory R. Bogart, Anthony E. Novembre, Avi Kornblit, Milton L. Peabody Jr., Reginald C. Farrow, Myrtle I. Blakey, Richard J. Kasica, James Alexander Liddle, Thomas E. Saunders, and Chester S. Knurek "Overview of SCALPEL mask technology", Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); https://doi.org/10.1117/12.346223
PROCEEDINGS
2 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

SCALPEL mask blank fabrication
Proceedings of SPIE (August 30 1999)
New design methodologies in (111)-oriented silicon wafers
Proceedings of SPIE (August 30 1999)
Silicon Diffraction Gratings For Multilayer Structures
Proceedings of SPIE (April 09 1987)
Simulations and experiments on the fabrication of silicon tip
Proceedings of SPIE (December 30 2003)
200-mm SCALPEL mask development
Proceedings of SPIE (June 25 1999)

Back to Top