23 April 1999 Results from submicron CD metrology obtained with new I-line tools
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Proceedings Volume 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98; (1999) https://doi.org/10.1117/12.346208
Event: 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components, 1998, Munich, Germany
Abstract
It will be reported on technical details, present typical measurement results and the performance of new I-line Linewidth Metrology Systems. The tools represent the latest results of the recently existing cooperation between Leica Microsystems, Wetzlar and MueTec, Munich on the area of High Performance Measurement Tools for CD measurement on photomasks. Up to now only Tools for measurements in the region of visible light were available. In contrast to systems with visible illumination, I-line CD tools basically have a clearly raised optical resolution power. They show essentially better linearity of the calibration curves and considerably better repeatability of measurements on structures in the submicron area, compared with system which only work in the region of visible light. So now CD measurements on submicron structures can be carried out in a completely new quality. I-line measurement results will be conformed with some results in the region of visible light.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hans-Juergen Brueck, Sebastian Birkenmayer, Guenther Falk, Gerd Scheuring, Lars Walden, Sigrid Lehnigk, "Results from submicron CD metrology obtained with new I-line tools", Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); doi: 10.1117/12.346208; https://doi.org/10.1117/12.346208
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