12 July 1999 Formation of ultrahard metal oxide nanocluster coatings at room temperature by electrostatic self-assembly
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Abstract
Different structures of multilayer hard coating thin-films have been fabricated on single crystal silicon and quartz substrates at room temperature by electrostatic self- assembly (ESA) method. This process involves the alternate dipping of oppositely charged polyelectrolytes. The ESA films have shown the formation of highly ordered and homogeneous structures with reduced voids. UV/VIs spectroscopy and ellipsometry were used to observe the ESA deposition process. The hardness and Young's modulus of the films were measured using nanoindentation technique.
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Aprillya Rosidian, Yanjing Liu, Richard O. Claus, "Formation of ultrahard metal oxide nanocluster coatings at room temperature by electrostatic self-assembly", Proc. SPIE 3675, Smart Structures and Materials 1999: Smart Materials Technologies, (12 July 1999); doi: 10.1117/12.352784; https://doi.org/10.1117/12.352784
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