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Design and development of thin film materials for 157-nm and VUV wavelengths: APSM, binary masking, and optical coatings applications
Development of a 0.1 μm linewidth fabrication process for x-ray lithography with a laser plasma source
Advanced negative i-line resist development on metal surfaces for next-generation lithography mask fabrication
Evaluation of photoacid generators in chemically amplified resists for x-ray lithography using an on-wafer photoacid determination technique
Production data from a Leica ZBA31H+ shaped e-beam mask writer located at the Photronics facility, Manchester, England
Simulation of resist heating using TEMPTATION software with different models of electron-beam energy deposition
Simulation on a new reflection type attenuated phase-shifting mask for extreme ultraviolet lithography