25 June 1999 Actinic EUVL mask blank defect inspection system
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Abstract
Recent experimental results from an actinic EUVL mask blank defect inspection system are presented. Bright-field and dark-field scans from various programmed defect samples are reported. Our results show that the current system can detect defects as small as 0.2 micrometers . Substrate roughness is identified as the limitation to the detection sensitivity. A preliminary defect counting experiment is reported and future improvements for practical defect counting are discussed.
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Seongtae Jeong, Lewis E. Johnson, Yun Lin, Senajith Rekawa, Pei-yang Yan, Patrick A. Kearney, Edita Tejnil, James H. Underwood, Jeffrey Bokor, "Actinic EUVL mask blank defect inspection system", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351101; https://doi.org/10.1117/12.351101
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