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25 June 1999 Actinic EUVL mask blank defect inspection system
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Recent experimental results from an actinic EUVL mask blank defect inspection system are presented. Bright-field and dark-field scans from various programmed defect samples are reported. Our results show that the current system can detect defects as small as 0.2 micrometers . Substrate roughness is identified as the limitation to the detection sensitivity. A preliminary defect counting experiment is reported and future improvements for practical defect counting are discussed.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Seongtae Jeong, Lewis E. Johnson, Yun Lin, Senajith Rekawa, Pei-yang Yan, Patrick A. Kearney, Edita Tejnil, James H. Underwood, and Jeffrey Bokor "Actinic EUVL mask blank defect inspection system", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999);

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