Design and development of thin film materials for 157-nm and VUV wavelengths: APSM, binary masking, and optical coatings applications

Bruce W. Smith; Anatoly Bourov; Lena Zavyalova; Michael J. Cangemi

doi:10.1117/12.351108

25 June 1999 Design and development of thin film materials for 157-nm and VUV wavelengths: APSM, binary masking, and optical coatings applications

Bruce W. Smith, Anatoly Bourov, Lena Zavyalova, Michael J. Cangemi

Author Affiliations +

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351108
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

As optical lithography below 193 nm is explored, materials issues become more challenging. Thin film coatings that are sufficient for use at wavelengths near or above 200 nm are more likely than not to be problematic at 157 nm, 126 nm, or other potential VUV wavelengths. The situation is a concern for optical coatings, masking films, and for resist/substrate reflectivity control. Potential solutions for several film types are presented, which have been deposited and optically characterized for use as attenuated phase shift masking films, binary masking films, and optical coatings for use at 157 nm.

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Bruce W. Smith, Anatoly Bourov, Lena Zavyalova, and Michael J. Cangemi "Design and development of thin film materials for 157-nm and VUV wavelengths: APSM, binary masking, and optical coatings applications", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351108

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