EUV scattering and flare of 10X projection cameras

Eric M. Gullikson; Sherry L. Baker; John E. Bjorkholm; Jeffrey Bokor; Kenneth A. Goldberg; John E. M. Goldsmith; Claude Montcalm; Patrick P. Naulleau; Eberhard Adolf Spiller; Daniel Gorman Stearns; John S. Taylor; James H. Underwood

doi:10.1117/12.351162

25 June 1999 EUV scattering and flare of 10X projection cameras

Eric M. Gullikson, Sherry L. Baker, John E. Bjorkholm, Jeffrey Bokor, Kenneth A. Goldberg, John E. M. Goldsmith, Claude Montcalm, Patrick P. Naulleau, Eberhard Adolf Spiller, Daniel Gorman Stearns, John S. Taylor, James H. Underwood

Author Affiliations +

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351162
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Two new Schwarzschild cameras have been fabricated for the EUV 10x microstepper. The surface topography of the mirrors was characterized over the full range of spatial frequencies both before and after multilayer coating. EUV scattering from the individual mirrors was measured and compared with the surface profilometry. A knife-edge test was used to directly measure the flare of the assembled cameras. The flare measured in this way is in excellent agreement with the contrast of isolated printed lines and with the point spread function of the camera as determined by EUV interferometry. The measured flare of the camera is also in good agreement with the flare calculated from the combined surface profile measurements of the individual mirrors. Consistent with the improvements made in the surface finish of the mirror substrates, a significant reduction in the flare is observed as compared with previously existing cameras.

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Eric M. Gullikson, Sherry L. Baker, John E. Bjorkholm, Jeffrey Bokor, Kenneth A. Goldberg, John E. M. Goldsmith, Claude Montcalm, Patrick P. Naulleau, Eberhard Adolf Spiller, Daniel Gorman Stearns, John S. Taylor, and James H. Underwood "EUV scattering and flare of 10X projection cameras", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351162

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