25 June 1999 Emission from a gas puff target irradiated with a Nd:YAG laser for EUV and x-ray lithography
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Abstract
Soft x-ray and extreme-UV emissions form plasmas produced using a gas puff target irradiated with a Nd:YAG laser has been investigated. The use of the gas puff targets, create by pulsed injection of high-density gas through a nozzle, eliminates the production of debris associated with solid targets. Laser pulses of either 0.9 ns or 10 ns time duration with energies up to 0.7 J were used to produce plasmas. Emissions in the 1-22 nm wavelength range from laser-produced gas puff plasma were characterized for various gases. The spectral measurements were performed with the use of grating spectrographs equipped with the back- illuminated CCD camera. The source sizes was measured using the Fresnel zone plate imaging system and the grating spectrograph equipped with a slit placed perpendicularly to the dispersion direction. The obtained results would allow to develop an efficient and debrisless laser-produced radiation source for applications in proximity x-ray lithography and extreme UV lithography technologies.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henryk Fiedorowicz, Henryk Fiedorowicz, Hiroyuki Daido, Hiroyuki Daido, Andrzej Bartnik, Andrzej Bartnik, Noriyuki Sakaya, Noriyuki Sakaya, Masayuki Suzuki, Masayuki Suzuki, Viliam Kmetik, Viliam Kmetik, Miroslaw Szczurek, Miroslaw Szczurek, Thomas Wilhein, Thomas Wilhein, } "Emission from a gas puff target irradiated with a Nd:YAG laser for EUV and x-ray lithography", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351112; https://doi.org/10.1117/12.351112
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