25 June 1999 Extended-source interferometry for at-wavelength testing of EUV optics
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Abstract
Although EUV-optics can be very accurately tested interferometrically employing a synchrotron, testing with a laser-induced or pinch plasma is attractive because of the lower cost of such sources. Within Philips Research a project has started to build an interferometer employing a laser plasma source and a Ronchi-test which is modified in such a way that two-beam interferograms are obtained. We analyze the accuracy, the vibration and drift sensitivity and the dynamic range of the interferometer for three different combinations of entrance and exit grating by means of computer-generated interferograms. The results are compared with an optical experiment, in which the relevant parameters of the interferometer have been scaled up so that visible light can be used.
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Matthieu Visser, Matthieu Visser, Martijn K. Dekker, Martijn K. Dekker, Petra Hegeman, Petra Hegeman, Joseph J. M. Braat, Joseph J. M. Braat, } "Extended-source interferometry for at-wavelength testing of EUV optics", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351096; https://doi.org/10.1117/12.351096
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