25 June 1999 Heating of x-ray masks during e-beam writing
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In this work we characterized the temperature increase in SiHN mask membrane during e-beam writing. We observed an exponential decay with a decay length in the order of 1mm-1, and absolute temperature raises of 8 degrees K. This is the first time that direct measurement have been obtained. By fitting the observed data, we have extracted the thermal conductivity and emissivity of the film. These experimental values are essential in the modeling of the response of the masks.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nikolai L. Krasnoperov, Nikolai L. Krasnoperov, Jaz Bansel, Jaz Bansel, Olga Vladimirsky, Olga Vladimirsky, John P. Wallace, John P. Wallace, Yuli Vladimirsky, Yuli Vladimirsky, Franco Cerrina, Franco Cerrina, } "Heating of x-ray masks during e-beam writing", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351083; https://doi.org/10.1117/12.351083


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