25 June 1999 Novel fiducial grid for x-ray masks
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Abstract
Advances in today's semiconductor industry have been achieved mainly by decreasing the minimal feature size thereby increasing the complexity of the devices. Lithography tool shave to provide for high resolution and large depth of focus. X-ray lithography offers promising solutions and is currently an actively researched area.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Choi Pheng Soo, Choi Pheng Soo, Shobhna Chandra, Shobhna Chandra, Kong Jong Ren, Kong Jong Ren, Antony J. Bourdillon, Antony J. Bourdillon, Bing Lu, Bing Lu, "Novel fiducial grid for x-ray masks", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351158; https://doi.org/10.1117/12.351158
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