25 June 1999 Optical materials and coatings at 157 nm
Author Affiliations +
We update previously reported results on the absorption of optical materials and coatings for use in 157 nm based optical projection system. New results include the transmissions spectrum of a modified from of fused silica with suitable initial transmission for use as a mask substrate. We also report on a more systematic study of the effects of surface contaminants on optical components at 157 nm. We have modified our vacuum spectrometer to allow in- situ cleaning to enable a closer examination of purging requirements and cleaning procedures.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Theodore M. Bloomstein, Theodore M. Bloomstein, Vladimir Liberman, Vladimir Liberman, Mordechai Rothschild, Mordechai Rothschild, D. E. Hardy, D. E. Hardy, Russell B. Goodman, Russell B. Goodman, "Optical materials and coatings at 157 nm", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351106; https://doi.org/10.1117/12.351106


Molecular beam deposition of fluorides
Proceedings of SPIE (November 03 1994)
Is extreme ultraviolet pellicle possible? in terms of...
Proceedings of SPIE (March 22 2012)
Challenges and opportunities for 157-nm mask technology
Proceedings of SPIE (December 29 1999)
Interfacial absorption of DUV coatings
Proceedings of SPIE (April 11 2001)
Laser-induced damage in pellicles at 193 nm
Proceedings of SPIE (May 31 1992)

Back to Top