Paper
25 June 1999 Reflectivity of Mo/Si multilayer systems for EUVL
Eric Louis, Andrey E. Yakshin, Peter C. Goerts, Salim Abdali, Edward L. G. Maas, R. Stuik, Fred Bijkerk, Detlef Schmitz, Frank Scholze, Gerhard Ulm, Markus Haidl
Author Affiliations +
Abstract
Normal-incidence reflectivity data of Mo/Si multilayer systems are being reported for the EUV wavelength range.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eric Louis, Andrey E. Yakshin, Peter C. Goerts, Salim Abdali, Edward L. G. Maas, R. Stuik, Fred Bijkerk, Detlef Schmitz, Frank Scholze, Gerhard Ulm, and Markus Haidl "Reflectivity of Mo/Si multilayer systems for EUVL", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351079
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Cited by 17 scholarly publications.
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KEYWORDS
Reflectivity

Multilayers

Extreme ultraviolet lithography

Absorption

Extreme ultraviolet

Interfaces

Lithography

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