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25 June 1999 Space-charge results from the SCALPEL proof-of-concept system
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Charged particle lithography systems face a unique challenge because throughput and resolution are linked through the dependence of beam blur on beam current. Understanding the function from of this dependence is vital, both for understanding the throughput limits of such systems, and also for the purposes of optimizing system design. We have developed a simple model describing the effects of image blur on printed resist feature size. The uncertainty in resist feature measurement enables us to determine the overall image blur to an accuracy of approximately 5 nm. We have also begun to develop an aerial image monitoring scheme that can, in principle, measure the image blur to an accuracy of<EQ 1 nm. While the resist based measurement scheme is useful for determining large space-charge blurs, and for optimizing the resist itself, the aerial image monitoring approach has sufficient accuracy to allow us to determine the functional dependence of beam blur on current.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James Alexander Liddle, Myrtle I. Blakey, Gregg M. Gallatin, Chester S. Knurek, Masis M. Mkrtchyan, Anthony E. Novembre, and Warren K. Waskiewicz "Space-charge results from the SCALPEL proof-of-concept system", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999);


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