25 June 1999 Vacuum spark and spherical pinch x-ray/EUV point sources
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Abstract
The technology of x-ray/EUV point plasma sources is competing with the multiple beam synchrotrons as radiation sources for submicron lithography. The company ALFT has been doing research and development on two plasma point sources for several years now. They are the vacuum spark (VSX) and spherical pinch (SPX) technologies. Both have a long history of previous research to support the contention that are well qualified to be converted into technological tools for the manufacturing of the next generation of IC chips. The VSX is essentially a miniature discharge capable of emitting soft x-ray radiation. Because the plasma emits a small dose of x- ray in each spark, it is necessary to repeat the phenomenon at high frequency in order to meet the requirement for microlithography. The SPX is mainly a strong source of EUV/X-ray radiation that operates at a frequency of one hertz or more.
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Frank F. Wu, Frank F. Wu, Wen-Chieh Tang, Wen-Chieh Tang, Kazimierz W. Wirpszo, Kazimierz W. Wirpszo, Emilio Panarella, Emilio Panarella, } "Vacuum spark and spherical pinch x-ray/EUV point sources", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351113; https://doi.org/10.1117/12.351113
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