25 June 1999 Zone-plate array lithography (ZPAL): a new maskless approach
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Abstract
This paper reviews recent progress in our development of a new maskless lithography scheme which utilizes an array of Fresnel zone plates to write arbitrary patterns on a wafer. Maskless, zone-plate-array lithography (ZPAL) should be capable of producing 25 nm feature sizes at a throughput of 1 cm2/second using 4.5 nm radiation form an undulator on a compact synchrotron. This wavelength will allow a large depth-of-focus with essentially no proximity effect at a large gap between the zone-plate array and the substrate. We present a detailed ZPAL system design, and show calculations and simulations which address issues of resolution, contrast, throughput, source characteristics, and micromechanical modulation schemes for x-ray beamlets in ZPAL. We review our experimental efforts in ZPAL in the x- ray and UV regions.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David J. D. Carter, Dario Gil, Rajesh Menon, Ihsan J. Djomehri, Henry I. Smith, "Zone-plate array lithography (ZPAL): a new maskless approach", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351104; https://doi.org/10.1117/12.351104
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