Step and flash imprint lithography: a new approach to high-resolution patterning

Matthew Colburn; Stephen C. Johnson; Michael D. Stewart; S. Damle; Todd C. Bailey; Bernard Choi; M. Wedlake; Timothy B. Michaelson; S. V. Sreenivasan; John G. Ekerdt; C. Grant Willson

doi:10.1117/12.351155

25 June 1999 Step and flash imprint lithography: a new approach to high-resolution patterning

Matthew Colburn, Stephen C. Johnson, Michael D. Stewart, S. Damle, Todd C. Bailey, Bernard Choi, M. Wedlake, Timothy B. Michaelson, S. V. Sreenivasan, John G. Ekerdt, C. Grant Willson

Author Affiliations +

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351155
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

An alternative approach to lithography is being developed based on a dual-layer imprint scheme. This process has the potential to become a high-throughput means of producing high aspect ratio, high-resolution patterns without projection optics. In this process, a template is created on a standard mask blank by using the patterned chromium as an etch mask to produce high-resolution relief images in the quartz. The etched template and a substrate that has been coated with an organic planarization layer are brought into close proximity. A low-viscosity, photopolymerizable formulation containing organosilicon precursors is introduced into the gap between the two surfaces. The template is then brought into contact with the substrate. The solution that is trapped in the relief structures of the template is photopolymerized by exposure through the backside of the quartz template. The template is separated from the substrate, leaving a UV-curved replica of the relief structure on the planarization layer. Features smaller than 60 nm in size have been reliably produced using this imprinting process. The resolution silicon polymer images are transferred through the planarization layer by anisotropic oxygen reactive ion etching. This paper provides a progress report on our efforts to evaluate the potential of this process.

Citation Download Citation

Matthew Colburn, Stephen C. Johnson, Michael D. Stewart, S. Damle, Todd C. Bailey, Bernard Choi, M. Wedlake, Timothy B. Michaelson, S. V. Sreenivasan, John G. Ekerdt, and C. Grant Willson "Step and flash imprint lithography: a new approach to high-resolution patterning", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351155

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available