14 June 1999 Accelerated testing technique for evaluating performance of chemical air filters for DUV photolithographic equipment
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Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999); doi: 10.1117/12.350874
Event: Microlithography '99, 1999, Santa Clara, CA, United States
Abstract
In this paper, the authors discuss the requirements for chemical air filtration system used in conjunction with modern DUV photolithography equipment. Among the topics addressed are the scope of pollutants, their respective internal and external sources, and an overview of different types of filtration technologies currently in use. Key filtration parameters, including removal efficiency, service life, and spill protection capacity, are discussed and supported by actual data, reflection the total molecular base concentration in operational IC manufacturing facilities. The authors also describe a time-accelerated testing procedure for comparing and evaluating different filtration technologies and designs, and demonstrate how this three-day test procedure can reliably predict an effective filter service life up to ten years.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Oleg P. Kishkovich, Dennis Bolgov, William Goodwin, "Accelerated testing technique for evaluating performance of chemical air filters for DUV photolithographic equipment", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350874; https://doi.org/10.1117/12.350874
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KEYWORDS
Carbon

Deep ultraviolet

Manufacturing

Particles

Contamination

Tolerancing

Environmental sensing

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