Algorithm for controlling objective lens temperature

Weiming Chen; Chao He; Yeyi Liu

doi:10.1117/12.350825

14 June 1999 Algorithm for controlling objective lens temperature

Weiming Chen, Chao He, Yeyi Liu

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350825
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

An algorithm for controlling DSW objective lens temperature is discussed in this paper. By applying a fuzzy control algorithm on the basis of PID control algorithm, we specify different P, I, and D values according to different ranges of temperature and different temperature tendencies. As a result, we gain high precision of temperature control.

Citation Download Citation

Weiming Chen, Chao He, and Yeyi Liu "Algorithm for controlling objective lens temperature", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350825

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available