14 June 1999 Determining measurement variation of lens parameters using Monte Carlo simulations
Author Affiliations +
Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999); doi: 10.1117/12.350852
Event: Microlithography '99, 1999, Santa Clara, CA, United States
Abstract
In this paper the strength of Monte Carlo simulations to estimate measurement variation in the outcomes of lens parameters is shown. A standard R and R study approach is compared to one in which Monte Carlo simulations are used. The biggest advantage in the latter case is that one can correct for the destructive kind of the measurement. Further, not only the accuracy improves, but also the time needed to perform the study reduces drastically and qualitative studies can be carried out easily.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wilco C.A. Ligthart, "Determining measurement variation of lens parameters using Monte Carlo simulations", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350852; https://doi.org/10.1117/12.350852
PROCEEDINGS
8 PAGES


SHARE
KEYWORDS
Monte Carlo methods

Computer simulations

Finite element methods

Semiconducting wafers

Time metrology

Scanning electron microscopy

Critical dimension metrology

Back to Top