14 June 1999 Production metrology and control of color filter array photolithography for CMOS imagers
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Abstract
The color filter array (CFA) for an image-producing semiconductor device is composed of patterned red-, and green- and blue-colored photoresist structures. CFA photolithography is rather different from that of most semiconductor process levels.
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Arnold W. Yanof, A. Daou, James P. Annand, M. Pantel, Cliff I. Drowley, John N. Helbert, Carlos L. Ygartua, Clive Hayzelden, "Production metrology and control of color filter array photolithography for CMOS imagers", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350821; https://doi.org/10.1117/12.350821
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