14 June 1999 Secondary electron spectroscopy for microanalysis and defect review
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Abstract
Secondary electron spectra have been obtained from a variety of materials under vacuum conditions similar to those encountered in a conventional scanning electron microscope. Although secondary emission is restricted to the near surface region of a sample, and so would be expected to be affected by the presence of a film of contamination, it is shown that the modifications to the secondary electron spectrum are generally minor in nature and do not make it impossible to associate the spectrum with the underlying material. Secondary electron spectroscopy may provide a method to add a materials classification category to defect review.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David C. Joy, Neeraj Khanna, David Braski, "Secondary electron spectroscopy for microanalysis and defect review", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350849; https://doi.org/10.1117/12.350849
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