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14 June 1999 Specular spectroscopic scatterometry in DUV lithography
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Abstract
Scatterometry is a one of the few types of metrology that has true in-situ potential for deep submicron CD and profile analysis. To date, commercial prototypes have been used to establish scatterometry based on single wavelength, multiple incident angle inspection. We extend this idea by deploying specular spectroscopic scatterometry (SSS). Conventional scatterometry is designed to measure either many diffraction orders or variable incident/collection angle at a single wavelength. Specular spectroscopic scatterometry is designed to measure the 0th order diffraction responses at a fixed angle of incidence. Specular spectroscopic scatterometry can make direct use of the existing spectroscopic ellipsometry equipment. We show that SSS provides an accurate, inexpensive, and non-destructive CD metrology solution.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xinhui Niu, Nickhil H. Jakatdar, Junwei Bao, Costas J. Spanos, and Sanjay K. Yedur "Specular spectroscopic scatterometry in DUV lithography", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350802
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